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Cluster Sputter
Cluster sputtering is a highly flexible R&D and pilot system that configures multiple processes in a single vacuum environment.
- Suitable for automated production lines and R&D systems
- Provides highly integrated technology and mechanisms
Applications
- Applicable to various thin film (metal, oxides, TCO) processes
- Applicable to highly integrated semiconductor and electronic component substrate processes
- Applicable to thin-film solar cell manufacturing processes
Specifications
| Configuration | Loading, Transfer, Pre-treatment, Deposition(PVD, CVD) |
|---|---|
| Transfer | Hi-vacuum automatic robot |
| Cathode | Planar or Round Magnetron cathode |
| Target | Metal, Oxide, TCO |