连续式 蒸镀 系统

在线式溅射系统采用全自动化连续工艺,在大规模量产中实现了高稼动率与均匀的薄膜品质。

Specification

Deposition Type In-Line Horizontal Type
Substrate Size Mass : ~ Gen.5.5
R&D ~ P/P : ~ Gen.2
Tact Time Mass : 2mins
R&D ~ P/P : 30mins
Evaporation Source Mass : Linear Source
R&D ~ P/P : Parallel Shot by Point Source
Thickness Uniformity Organic : ≤± 3%(Organic), ≤± 4%(Metal)
Align Accuracy Mechanical Align : ≤± 150㎛