Áø°ø ºÎÇ° ¹× Sputtering¿ë Alloy Target

  • Áø°ø ºÎÇ° ¹× Sputtering¿ë Alloy Target
  • Áø°ø ºÎÇ° ¹× Sputtering¿ë Alloy Target
  • Áø°ø ºÎÇ° ¹× Sputtering¿ë Alloy Target

¢¹ ÀÚü Á¦ÀÛÇ°ÀÎ È¿À²ÀûÀÌ°í ½Å·Ú¼º ³ôÀº Sputtering¿ë Cathode ¹× Alloy Target, À¯/¹«±â ÁõÂø¿ø ¹× °ü·Ã ºÎÇ°À» °ø±Þ.

Sputtering Cathode
- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
Sputtering Target
- Target Material : Metal (Silver, Gold, Titan Color¿ë)
Evaporation Source
- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material